Updated 28.8.2016
The 16th International Conference on Atomic Layer Deposition ALD2016 (http://www.ald2016.ie), including the 3rd International Workshop on Atomic Layer Etching, was organized in Dublin, Ireland, July 24-27, 2016. I had a pleasure to participate at the conference as a speaker, poster presenter, and as an International Programme Committee member. This blog post shares my travel notes from conference, thereby continuing my series on travel notes first written for the ALD Russia 2015 workshop and thereafter for Baltic ALD 2015, my St Petersburg visit Nov 2015, and HERALD Helsinki seminar May 2016.
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| ALD 2016 conference chairs Simon Elliott and Jonas Sundqvist. Photo from Twitter, @jv3sund. |
Since the first American Vacuum Society Topical Conference on Atomic Layer Deposition in Monterey CA 2001, the international ALD conference series organized every odd year in USA by the AVS and every even year outside USA in collaboration with AVS, has evolved into a major event that provides the best possible snapshot of ALD at the forefront of science at academia and industry alike. There were more than 800 registered participants at the meeting, of which about 50% were industrial; and about 400 presentations, of which about 10% were industrial. The conference lasted for three days and comprised maximum four parallel sessions and two days of poster sessions. All presentations were recorded and will be made available on a DVD after the conference (past DVDs can be bought from AVS by contacting heather@ avs.org).
