Molecular Layering in the 2018 Millennium Prize Nomination letter

In 2018, Dr. Tuomo Suntola received the Millennium Technology Prize (MTP) for his groundbreaking work on Atomic Layer Deposition (ALD). In addition to being a personal recognition to Suntola, the MTP 2018 was a great recognition to ALD as an enabler of many technologies and of the continuation of Moore’s law. The whole field has benefited.

In the Virtual Project on the History of ALD (VPHA), materials (publications, Wikipedia updates) have been created which supported the nomination. In summer 2017, it was a natural continuation of VPHA to write the MTP nomination letter for me in the name of my university.

ALD has been invented independently twice - under the name Atomic Layer Epitaxy by Tuomo Suntola in 1974, and under the name Molecular Layering by Valentin Aleskovskii and Stanislav Koltsov already in the 1960s (see, e.g., Wikipedia).

When writing the MTP nomination letter, in addition to describing Suntola’s groundbreaking work and the impact of ALD from all angles, I also - of course - I wanted to acknowledge the pioneering work of Aleskovskii and Koltsov, who both have already passed away.

CU Boulder Today, ALD NanoSolutions, VPHA

CU Boulder Today published on Feb 7, 2017 a nice article describing the history of the company ALD NanoSolutions, a spin-off from the University of Colorado Boulder. ALD NanoSolutions is specialized in atomic layer deposition (ALD) for the coating of particles. Link to article: http://www.colorado.edu/today/2017/02/07/spinoff-company-all-cu-boulder-family.

Some quotes from the CU Boulder Today article:

• In 1997, Professor Alan Weimer of chemical and biological engineering heard a campus talk by Professor Steven George of chemistry about a novel process of coating surfaces with the thinnest of materials possible, known as atomic layer deposition (ALD).
• Within a few years Weimer and George had filed a number of patents on the technology, gaining exclusive rights to a wide range of intellectual property.
• “This company has executed with focus and pragmatism since we formed it, and now we are moving into high gear commercially,” says Weimer. “And we have what I call a lot of high-end ethics within the company, which is very important to all of us. That is one reason we are all still together after all these years.”

My first recollection of ALD NanoSolutions is from early 2000s, from the time I was a doctoral student at Helsinki University of Technology - nowadays Aalto University - in the Industrial Chemistry group of Prof. Outi Krause during 1999 to 2002. My research concerned particle ALD for catalyst applications. I started in 1998 as a diploma worker at Microchemistry Ltd. (nowadays part of ASM) in a research line which had been started many years earlier in Finland by Tuomo Suntola at Microchemistry Ltd. and the Finnish oil company Neste Oy (for more info, see the "Suntola story" in CVD 2014, details below). At HUT, we were of course curious of this new company: who is behind it, what is the technology, how will it commercialize ALD? 

Photo of Riikka after visiting ALD NanoSolutions March 18, 2014. (I cannot recall who took the photograph upon my request.  I will be to happy to add the name of the photographer here if the person who remembers to have taken the photo, will contact me.) 

Fast forward more than a decade. In 2014, I had a chance to travel to Boulder and visit Prof. Steven George and his group. At this moment, I worked as a Senior Scientist at VTT Technical Research Centre of Finland.

Views on Wikipedia related to ALD and VPHA

People of all sorts of backgrounds (including journalists and politicians) use Wikipedia as a quick source to find basic information on a variety of subjects.

The next image shows pageviews analysis for a few pages relevant to ALD and VPHA, taken on January 28, 2017, and showing the statistics for the past twenty days. For example, the page of atomic layer deposition is viewed typically 100 to 200 times per day, while chemical vapor deposition is viewed typically 300 to 700 times per day. There is a pattern related to week days: towards weekend, there are less views. To compare, in ALD History Blog, the typical number of pageviews for an average page is several tens; the most viewed post (travel notes from ALD 2016) has received 297 views all time as of Feb 28, 2017.

I have during VPHA understood how valuable Wikipedia and also Wikimedia Commons are as a sources, and I invite everyone to contribute in continuously improving their information. Non-specialists will appreciate clear and jargon-free language, logical structure of the page, good pictures and relevant references. Review articles should be good as links. All references should be openly available for viewing---regarding scientific articles, this means that they should be not be behind a paywall but be of open access.

Wikipedia List of multiple discoveries updated with ALD

The Wikipedia page List of multiple discoveries has been updated by adding ALD in the list of multiple discoveries in the 20th century. With this addition, the VPHA Publication Plan Item 11 "Updating wikipedia" is completed.

The update consists of the addition of the following text:

• The principles of atomic layer deposition, a thin film growth method in its part enabling the continuation of semiconductor device scaling according to the Moore's law in the 2000s, were developed by Soviet scientists Valentin Aleskovsky and Stanislav Koltsov in the early 1960s and independently discovered in 1974 by Tuomo Suntola.^[72][73][74]

The three references mentioned are the three reviews/essays generated in the Virtual Project on the History of ALD:

ALD history at ALD 2016 Ireland

Prof Greg Parsons introducing Prof Anatoly Malygin to give a plenary talk at ALD 2016. Photo by Riikka Puurunen.

The ALD 2016 conference was a major step forward in advancing the understanding of the worldwide history of Atomic Layer Deposition (ALD). Progress took place at least in three ways:

1. Prof. Anatoly Malygin (St. Petersburg State Technological Institute (Technical University)) delivered an invited talk. ALD 2016 was the first time ever that a person representing the branch of ALD of "old Russian works" has presented a talk at the international ALD conferences. Great thanks Prof. Malygin delivering the talk as well as for the conference chairs Dr. Simon Elliott and Dr. Jonas Sundqvist for inviting him.

Molecular Layering essay by Malygin et al. published

It is my great pleasure to inform that the essay by Malygin et al. has finally been published. This is Item #8 in the VPHA Publication Plan.

Link: http://onlinelibrary.wiley.com/doi/10.1002/cvde.201502013/abstract

Abstract: This essay is dedicated to the history of creation and development of the molecular layering technique (ML) which, in the modern community of non-Russian scientists, is commonly referred to as atomic layer deposition (ALD). Basic research in the field of chemical transformations of solid surfaces using the ML method in the light of the “framework” hypothesis proposed by V. B. Aleskovskii in 1952 is discussed. A number of questions raised by international scientists including those involved in the Virtual Project on the History of ALD (VPHA, 2013), and scientists from conferences in Helsinki (Finland, May 2014.), Kyoto (Japan, June 2014), and personal communications amongst peers are addressed. For the first time in English, this article provides information about V. B. Aleskovskii and S. I. Kol'tsov who are closely associated with development of the ML technique in the Soviet Union. This paper also informs the scientific community about research groups currently engaged in ML research in Russia and introduces the scientific school of “Chemistry of highly organized substances”, founded and supervised by V. B. Aleskovskii.