Last updated 14.9.2016
Dr. Suvi Haukka, executive scientist at ASM, located Finland, was awarded the ALD Innovation prize at the ALD 2016 Ireland conference. In general the prize, awarded since 2011, is given "For innovative research in ALD and Service to the ALD community". Conference chair(s) choose the receiver of the prize. Personal justification for Dr. Suvi Haukka was described by Prof. Gregory Parsons, last year's awardee as:
"For pioneering studies of ALD surface chemistry and for advocating the importance of fundamental understanding for ALD industrial scaling".
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Prof. Greg Parsons handing Dr. Suvi Haukka the ALD innovation prize. Photo by Riikka Puurunen.
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Dr. Suvi Haukka has had a lifetime career in
Atomic Layer Deposition (ALD). She started at Microchemistry Ltd. with Dr.
Tuomo Suntola in 1990 and has since then advanced the science and technology of ALD worldwide. Since the Dutch
ASM International bought Microchemistry in 1999, Suvi Haukka has been in key role at ASM in bringing ALD as a standard means of manufacturing in the semiconductor industry. A major milestone was the adoption of ALD by
Intel in CMOS transistor gate dielectrics in 2007. Today, ALD equipment manufacturing is multi-USD100M business yearly. Dr. Suvi Haukka holds over 100 patents related to ALD.