Analysis of "Erratum: “History of atomic layer deposition and its relationship with the American Vacuum Society” [J. Vac. Sci. Technol. A 31, 050818 (2013)]"

A correction has been recently published related to a scientific review article on the history of atomic layer deposition (ALD). The correction is entitled "Erratum: “History of atomic layer deposition and its relationship with the American Vacuum Society” [J. Vac. Sci. Technol. A 31, 050818 (2013)]" and it is authored by G. N. Parsons, J. W. Elam,  S. M. George, S. Haukka,  H. Jeon,  W. M. M. Kessels,  M. Leskelä, P. Poodt, M. Ritala, and S. M. Rossnagel. It is published in Journal of Vacuum Science & Technology A 38 (2020) 037001; https://doi.org/10.1116/6.0000143. As the title indicates, the article corrects an article published earlier in the same journal, by the same authors: Journal of Vacuum Science & Technology A 31 (2013) 050818; https://doi.org/10.1116/1.4816548.

This blog post analyses, what exactly has changed.

Paragraph corrected describing the early days of the molecular layering origin of ALD

The publication (https://doi.org/10.1116/6.0000143) says that the first two and the last two sentences of the fourth paragraph of Section II, which describes molecular layering, are changed. 

The new, updated paragraph has not been recreated in full. To help the scientific ALD community, I have here attempted to recreate the corrected paragraph.

ECS meeting invited ALD history talk: slides and proceedings

In October 2018, I had the honor to give an invited talk at the Electrochemical Society (ECS) fall meeting, organized in Cancun, Mexico (AiMES2018). ECS has had an ALD session since early 2000s. For me, this was the first time to attend the event: I got a very nice impression of the ALD session specifically and on this massive meeting in general.

The talk was called "Learnings from an Open Science Effort: Virtual Project on the History of ALD". Abstract is as follows:

"This work summarizes learnings from an Open Science effort “Virtual project on the History of ALD” (VPHA), started in 2013 to clarify the early history of atomic layer deposition (ALD). ALD is a multi-tool of nanotechnology and has been e.g. enabler of the continuation of Moore’s law of transistor scaling. ALD has been developed historically through two independent routes: atomic layer epitaxy (ALE) and molecular layering (ML). Especially the details on ML have remained little known to a broader audience. In this contribution, learnings in VPHA are seen from the viewpoint of its voluntary coordinator (the author self) related to historical details of ALD as well as from an organizational viewpoint and some other viewpoints. Selected details related to ALD’s history not fully accurately described in three earlier review articles are pointed out. The work made in VPHA has resulted in journal articles, presentations and an exhibition, and VPHA has in part provided the foundation for granting the 2018 Millennium Technology Prize to Dr. Tuomo Suntola. At the time of writing this contribution, in July 2018, VPHA is still on-going, and more volunteers are welcome to join the effort."

The slides are available through ECSarXiv: https://ecsarxiv.org/u6vw7/ (DOI: 10.1149/osf.io/u6vw7).

VPHA website updated with ECS Transactions article info

The VPHA website, http://vph-ald.com, has been on July 28, 2018 updated with info of the ECS Transactions article in press:

• Proceedings: R. L. Puurunen, "Learnings from an Open Science Effort: Virtual Project on the History of ALD", ECS Transactions, in press (2018). Open access preprint, DOI: 10.1149/osf.io/exyv3.

As the international ALD 2018 conference in Korea starts on July 29, 2018, it is good to spread the message that VPHA is still on-going and more volunteers are welcome to join. As communicated in the VPHA status update in May 2018, the plan is to produce jointly one more brief concluding review article from within VPHA. (Previous publications are listed in the Publication Plan here; the review now in question belongs to Item 10.) The articles produced earlier from within VPHA have become impactful within the field of ALD what comes to citations and other attention (see e.g. Altmetrics for the "ALE essay"). The last review is expected to be impactful, too.

VPHA status update 22.7.2018 - ECS Transactions info

The message below was sent to 76 VPHA contributors and 56 prospective contributors.

---

From: Puurunen Riikka
Sent: 22 July 2018 22:31
To: info @ vph-ald.com
Cc: Puurunen Riikka; jonas.sundqvist@ <>
Subject: VPHA status update 22.7.2018 - ECS Transactions info

Dear current and prospective VPHA contributors,

This VPHA update shares information on an ECS Transactions article related to an invited talk at the ECS fall symposium. The previous VPHA status update was sent on May 28, 2018. All VPHA status updates published in the ALD History Blog can be viewed in this link.

Best regards,

Riikka Puurunen, voluntary VPHA coordinator