The email below was sent to 68 co-authors and 31 prospective co-authors.
Dear VPHA co-authors and prospective co-authors,
I would like to communicate quick updates on the status of VPHA again.
VPHA voting.
Today is the DL to participate in the voting for the "conclusive recommended reading list" for the ALD 2016 poster. So far, we have collected 299 points. Thank you for the many people who have voted. Everyone who votes, will be a co-author of the planned publication to JVSTA, which reports the "conclusive recommended reading list." Tommorrow I will start to prepare the poster on the basis of the information received.
BALD 2016, St Petersburg.
(1) The abstract submission deadline of BALD 2016 (http://bald2016.ru/) has been postponed by the organizers and is now June 25th.
(2) I have been presented with the possibility of delivering an invited talk at the conference regarding the history of ALD. Below I have copied the text of the submitted abstract (title: "On the history of ALD and the VPHA project"). My goal was to thank all VPHA co-authors (who have left at least one comment in the ALD-history-evolving-file, as of the moment of submission, June 15th) in the acknowledgements. Please check that your name is there; if you notice a name missing let me know, I think I can still update the abstract.
Best regards,
Riikka Puurunen, VPHA coordinator
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Riikka Puurunen (Dr.), Senior Scientist, Microsystems and Nanoelectronics; Project Manager (IPMA C)
VTT Technical Research Centre of Finland, Tietotie 3, Espoo (P.O. Box 1000), FI-02044 Espoo (VTT), Finland
------- Abstract submitted to BALD 2016 starts --------
On the history of ALD and the VPHA project
Riikka L. Puurunen,1 Yury Koshtyal,2 Henrik Pedersen,3 J. Ruud van Ommen,4 Oksana Yurkevich,5 Jonas Sundqvist6
1VTT Research Centre of Finland Ltd, Espoo, Finland
2 Ioffe Institute, St. Petersburg, Russia
3 Linköping University, Linköping, Sweden
4 Delft University of Technology, Delft, the Netherlands
5 Immanuel Kant Baltic Federal University, Kaliningrad, Russia
6 Lund University, Lund, Sweden; and The Fraunhofer IKTS, Dresden, Germany
E-mail: riikka.puurunen@ vtt.fi
Atomic Layer Deposition (ALD), based on the repeated, self-terminating gas—solid reactions of at least two gaseous compounds on a solid substrate, has become a disruptive key enabling materials manufacturing method. By its inventors, this method was given the name Molecular Layering (1960s, Soviet Union) and Atomic Layer Epitaxy (1970s, Finland). While the original names still live on, gradually since the 1990s, "ALD" has evolved to be the mostly commonly used name for the technique.
Virtual Project on the History of ALD (VPHA) was set up in summer 2013 as an open effort, in which volunteered scientists from all around the world work together in an atmosphere of openness, respect and trust to better understand the early days of ALD ("early" is defined here to end in 1986). VPHA has already resulted in joint publications, a tutorial, two essays, an exhibition, Wikipedia updates, and a blog; see http://vph-ald.com and VPHA publication plan for details.
This presentation at the 14th International Baltic Conference on Atomic Layer Deposition aims to be the last organizational talk of VPHA. The presentation has two goals. First, it will overview of the activities and results of VPHA. Second, it will---on the basis of the new big picture developed in VPHA---summarize the major steps of advancement, which have taken place in the early research and technology of ALD around the world.
Acknowledgement: We are grateful to Tuomo Suntola, Anatoly Malygin and Victor Drozd their general support during the VPHA, to Aziz Abdulagatov and Annina Titoff for help in initiating the VPHA, and to Angel Yanguas-Guil for help with creating and updating ALD-related Wikipedia pages. We kindly thank all participants of VPHA who (as of June 15, 2016) have shared comments in the ALD-history-evolving-file (in alphabetical order): Jaan Aarik, Esko Ahvenniemi, Andrew Akbashev, Saima Ali, Mikhael Bechelany, Maria Berdova, David Cameron, Nikolai Chekurov, Mikhail Chubarov, Véronique Cremers, Victor E. Drozd, Simon D. Elliott, Liliya Elnikova, Gloria Gottardi, Kestutis Grigoras, Dennis Hausmann, Cheol Seong Hwang, Shih-Hui Jen, Marcel Junige, Tanja Kallio, Jaana Kanervo, Ivan Khmelnitskiy, Do Han Kim, Lev Klibanov, Outi Krause, Jakob Kuhs, Irina Kärkkänen, Marja-Leena Kääriäinen, Tommi O. Kääriäinen, Luca Lamagna, Adam Lapicki, Markku Leskelä, Harri Lipsanen, Jussi Lyytinen, Anatolii Malkov, Anatolii Malygin, Christian Militzer, Jyrki Molarius, Małgorzata Norek, Cagla Ozgit-Akgun, Mikhail Panov, Luis Fabián Peña, Fabien Piallat, Georgi Popov, Alexander Pyymaki Perros, Geert Rampelberg, Robin H. A. Ras, Erwan Rauwel, Fred Roozeboom, Timo Sajavaara, Hossein Salami, Hele Savin, Nathanaelle Schneider, Thomas E. Seidel, Pia Sundberg, Dmitry Suyatin, Massimo Tallarida, Tobias Törndahl, Mikko Utriainen, Thomas Waechtler, Claudia Wiemer, and Oili M. E. Ylivaara. RLP acknowledges partial funding from the Finnish Centre of Excellence in Atomic Layer Deposition by the Academy of Finland.
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Virtual Project on the History of ALD (VPHA) - in atmosphere of Openness, Respect, and Trust