Registration open for 2020 November Networking – ALD at Aalto University, Part 1: Public Webinar

Continuing the tradition (?) started in 2019, a networking event will be organized around atomic layer deposition (ALD): 2020 November Networking – ALD at Aalto University. The event will take place on November 25 and 26, 2020.

Due to COVID-19, in 2020, the event will be fully online in Zoom. The program will be in two parts:

• Part 1: Public webinar is open for anyone to attend and has high-level invited speakers: Dr. Jonas Sundqvist, Dr. Tuomo Suntola and Dr. Angel Yanguas-Gil. Additionally, there will be tutorials by Prof. Riikka Puurunen and Prof. Matti Putkonen. (See the webpage & program for details.)
• Part 2: Local networking is aimed for local (Finland-based) participants. The core of  Part 2 will be an online poster session where submissions from doctoral students, postdocs and other researchers are welcome. Additionally, there will be brief introductions to research groups, companies and projects, and a presentation by Prof. Timo Sajavaara on the characterization of ALD films. For the poster session we hope to create an online experience that resembles a regular conference’s poster session -- let’s see how it works out.

The registration link and all related info, including a preliminary program, are found in the event website: https://www.aalto.fi/en/events/2020-november-networking-ald-at-aalto-university. Registration was opened on 21.10.2020 and will close for participation with presentation on 11.11.2020 and for participation without presentation 22.11.2020.

ALD Stories podcast: Episode 2 on the History of ALD

On October 16, 2020, ALD stories podcast Episode 2 was published, where Riikka Puurunen -- coordinator of the Virtual Project on the History of ALD (VPHA) -- was interviewed by representatives of Beneq Oy.

The Episode 2 was centered around the history of atomic layer deposition (ALD), but was also a "fireside chat" on many other topics. Mentioned were for example: conformality; catalysis; 40 Years of ALD in Finland – Photos, Stories (FinALD40 exhibition); Baltic ALD 2014 conference; story of Suntola’s atomic layer epitaxy; two almost parallel inventions of ALD; Beneq applab opening in St. Petersburg 2013; molecular layering; 1st international conference on atomic layer epitaxy 1990; international ALD conference series; November Networking – ALD at Aalto University; Millennium Technology Prize; Virtual Project on the History of ALD; ALD window; misconception of full monolayer growth per cycle for ideal ALD; conformality test concept & saturation profile & lumped sticking coefficient.

Persons mentioned, at least: Outi Krause, Suvi Haukka, Tuomo Suntola, Sven Lindfors, Arto Pakkala, Victor Drozd, Valentin Aleskovskii, Angel Yanguas-Gil, Jonas Sundqvist. Companies mentioned: Microchemistry, Neste, Beneq, Lohja, Picosun.

This podcast should be interesting for those interested in the history of ALD and the two independent inventions (atomic layer epitaxy and molecular layering). For example, it shares details related to the birth of the two ALD history essays in Chemical Vapor Deposition journal, which have not been presented earlier. 

The podcast is available in at least via: