A correction has been recently published related to a scientific review article on the history of
atomic layer deposition (ALD). The correction is entitled
"Erratum: “History of atomic layer deposition and its relationship with the American Vacuum Society” [J. Vac. Sci. Technol. A 31, 050818 (2013)]" and it is authored by
G. N. Parsons, J. W. Elam, S. M. George, S. Haukka, H. Jeon, W. M. M. Kessels, M. Leskelä, P. Poodt, M. Ritala, and S. M. Rossnagel. It is published in Journal of Vacuum Science & Technology A 38 (2020) 037001; https://doi.org/10.1116/6.0000143. As the title indicates, the article corrects an article published earlier in the same journal, by the same authors:
Journal of Vacuum Science & Technology A 31 (2013) 050818; https://doi.org/10.1116/1.4816548.
This blog post analyses, what exactly has changed.
Paragraph corrected describing the early days of the molecular layering origin of ALD
The publication (
https://doi.org/10.1116/6.0000143) says that the first two and the last two sentences of the fourth paragraph of Section II, which describes molecular layering, are changed.
The new, updated paragraph has not been recreated in full.
To help the scientific ALD community, I have here attempted to recreate the corrected paragraph.
