Friday, 11 March 2016

VPHA abstract submitted to Ireland ALD 2016: 51 authors

Abstract of the Virtual Project on the History of ALD (VPHA) --- item #9 in the publication plan --- was submitted to Ireland ALD 2016 conference, with 51 authors from 15 countries. (After the submission, one person has already joined, so now we are with 52.) The abstract text is copied in full below.

The work that now remains to do related to the ALD 2016 presentation is to (i) complete the VPHA reading and (ii) create a "conclusive recommended reading list" of the most important early publications and applications. Creating this list will be collaborative work, where all VPHA participants can equally influence the results. More to come on the selection method later---we will first have to decide how to do it.

Interestingly, the conference publishes short biographies of the invited speakers. Here you find links to the current VPHA co-authors who are also invited speakers at the conference: Prof. Anatolii Malygin, Prof. Fred Roozeboom, Dr. Massimo Tallarida.

--- VPHA abstract submitted to Ireland ALD 2016 ---


On the early history of atomic layer deposition: most significant works and applications

Atomic layer deposition (ALD) is a technique that has been instrumental in enabling the semiconductor industry to maintain its adherence to Moore’s Law, and is becoming a game-changer in several other fields. A worldwide voluntary effort called “Virtual Project on the History of ALD” (VPHA), open for everyone with an ALD background to participate, was launched in summer 2013 to explore how the ALD concept was developed; which were the first ALD experiments; when, where, why and by whom they were made. Earlier VPHA outcomes were published at ALD 2014 (accessed through VPHA’s website http://vph-ald.com); VPHA has made steady progress since then. Here we will present a conclusive recommended reading list of the most significant early ALD publications and briefly review the most important individual works and applications.


Acknowledgements: We are grateful for Dr. Tuomo Suntola’s general support during the VPHA and for Dr. Aziz Abdulagatov’s and Annina Titoff’s assistance in initiating it. The VPHA would not have been possible without the recent advances in professional social networking and cloud computing. RLP acknowledges partial funding from the Finnish Centre of Excellence in Atomic Layer Deposition. The author list is intentionally in alphabetical order.

Jaan Aarik
University of Tartu, Institute of Physics, Estonia
Esko Ahvenniemi
Aalto University, Espoo, Finland
Andrew R. Akbashev
Drexel University, Philadelphia, Pennsylvania, USA
Mikhael Bechelany
CNRS University of Montpellier, Montpellier, France
Maria Berdova
Aalto University, Espoo, Finland
David Cameron
Masaryk University, Brno, Czech Republic
Nikolai Chekurov
Oxford Instruments Analytical Oy, Espoo, Finland
Mikhail Chubarov
SIMaP, Grenoble-INP, France
Viktor Drozd
St. Petersburg State University, St. Petersburg, Russia
Simon Elliott
Tyndall National Institute, University College Cork, Lee Maltings, Cork, Ireland
Gloria Gottardi
Fondazione Bruno Kessler, Center for Materials and Microsystems, Trento, Italy
Kestutis Grigoras
VTT Technical Research Centre of Finland, Espoo, Finland
Cheol Seong Hwang
Seoul National University, Seoul, Korea
Marcel Junige
Technische Universität Dresden, Dresden, Germany
Tanja Kallio
Aalto University, Espoo, Finland
Jaana Kanervo
Aalto University, Espoo, Finland
Khmelnitskiy, Ivan
St. Petersburg Electrotechnical University “LETI”, St. Petersburg, Russia
Yury Koshtyal
Ioffe Institute, St. Petersburg, Russia
Outi Krause
Aalto University, Espoo, Finland
Marja-Leena Kääriäinen
University of Colorado Boulder, Colorado, USA
Tommi Kääriäinen
University of Colorado Boulder, Colorado, USA
Luca Lamagna
STMicroelectronics, Agrate Brianza, Italy
Harri Lipsanen
Aalto University, Espoo, Finland
Jussi Lyytinen
Aalto University, Espoo, Finland
Anatoly Malkov
St. Petersburg State Technological Institute (Technical University),St. Petersburg, Russia
Anatoly Malygin
St. Petersburg State Technological Institute (Technical University),St. Petersburg, Russia
Jyrki Molarius
VTT Technical Research Centre of Finland, Espoo, Finland
Małgorzata ("Gosia") Norek
Military University of Technology, Warsaw, Poland
Cagla Ozgit-Akgun
Bilkent University, Ankara, Turkey
Mikhail Panov
St. Petersburg Electrotechnical University “LETI”, St. Petersburg, Russia
Henrik Pedersen
Linköping University, Linköping, Sweden
Fabien Piallat
Altatech, Montbonnot, France
Georgi Popov
University of Helsinki, Finland
Riikka L. Puurunen
VTT Technical Research Centre of Finland, Espoo, Finland
Alexander Pyymaki-Perros
Aalto University, Espoo, Finland
Robin H. A. Ras
Aalto University, Espoo, Finland
Fred Roozeboom
Eindhoven University of Technology, Eindhoven, and TNO, Eindhoven, The Netherlands
Timo Sajavaara
University of Jyväskylä, Jyväskylä, Finland
Hele Savin
Aalto University, Espoo, Finland
Thomas E. Seidel
Seitek50, Palm Coast, Florida, USA
Pia Sundberg
Aalto University, Espoo, Finland
Jonas Sundqvist
Lund University, Lund, Sweden
Dmitry Suyatin
Lund University, Lund, Sweden
Massimo Tallarida
ALBA Synchrotron Light Source, Barcelona, Spain
Tobias Törndahl
Uppsala University, Uppsala, Sweden
Mikko Utriainen
VTT Technical Research Centre of Finland, Espoo, Finland
J. Ruud van Ommen
Delft University of Technology, Delft, the Netherlands
Thomas Wächtler
Fraunhofer ENAS & TU Chemnitz, Chemnitz, Germany
Claudia Wiemer
Laboratorio MDM, IMM-CNR, Agrate Brianza, Italy
Oili M. E. Ylivaara
VTT Technical Research Centre of Finland, Espoo, Finland
Oksana Yurkevich
Immanuel Kant Baltic Federal University, Kaliningrad, Russia

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Virtual Project on the History of ALD (VPHA) - in atmosphere of Openness, Respect, and Trust

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