Showing posts with label Aalto University. Show all posts
Showing posts with label Aalto University. Show all posts

Wednesday, 30 November 2022

Speech by jubilee doctor Tuomo Suntola at Ceremonial Confernmet of Aalto University, 2022

Speech given at the Ceremonial Confernmet of Aalto University 17.6.2022 by the jubilee doctor Tuomo Suntola, republished in ALD History Blog, with permission by Dr. Tuomo Suntola. 

Promootio, Aalto yliopisto 17.6.2022 Tuomo Suntola

Arvoisa rehtori, provosti ja dekaani, hyvät professorit, kunniatohtorit, riemutohtorikollegat ja vasta promovoidut tohtorit, hyvät naiset ja herrat ladies and gentlemen ...

I feel privileged and honored to come back to the home of my academic studies to Aalto University and this Dipoli building which, originally, was built to serve as the student house.

In 1963, as a first-year student, I had the obligation and honor to participate the building work the modest task I remember was to help in removing building wastes from a space which now is the income lobby under this hall.

In the 70s, for 50 years ago, there was a kind of second industrialization boom in Finland. Previous decades had produced heavy industry like pulp and paper, metal, and shipbuilding now there was an active demand for high technology which meant a major challenge to technologists.

I was captured to the high-tech boom in an early stage of my doctor’s career. I had just completed a successful development project in VTT Semiconductor Laboratory here in Otaniemi, when I was invited to start a new research activity in a medical instrumentation company to create something unique to the products.

My proposal was to develop a thin film flat panel display based on electroluminescence, with the warning that nobody, by far, has been able to make such devices. The board of directors answered to my proposal with silence until the chairman stated: “I am still confused, but at a higher level – let’s go ahead”. The flat panel display came true in ten years but the novel thin film technology behind the success turned out to be far more valuable. It took another ten years to develop the technology to semiconductor manufacturing, and the next ten years to get it accepted by the industry then the technology carried itself to an exponential growth which still continues.

We may be used to think that technical development is driven in weeks or months at least when seeing that new models of mobile phones appear every week and a new electric car every month. The roots of fast development extend deep and wide the more fundamental issues we are working with, the wider is the scope of new opportunities, but the more diverged and complex are the problems to be solved. For a scientist and technologist, a real skill and challenge is to see the essential and simplicity behind the complexity. I have always admired artists drawing cartoons or caricatures with a few lines they are able express and bring up the essential.

World has really changed during the last fifty years not least thanks to the huge development of electronics and telecommunication. If somebody had been able to tell me at the time of my doctoral thesis where we are today, I had regarded that as science fiction and something absolutely impossible.

I sincerely hope that every one of you, now celebrating your doctor’s degree, can after 50 years enjoy and feel having been part of development that we consider science fiction and impossible today. For that, I wish you inspiration, bright thinking, and of course a drop of good luck! 

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Virtual Project on the History of ALD (VPHA) - in atmosphere of Openness, Respect, and Trust

Friday, 23 October 2020

Registration open for 2020 November Networking – ALD at Aalto University, Part 1: Public Webinar

Continuing the tradition (?) started in 2019, a networking event will be organized around atomic layer deposition (ALD): 2020 November Networking – ALD at Aalto University. The event will take place on November 25 and 26, 2020.

Due to COVID-19, in 2020, the event will be fully online in Zoom. The program will be in two parts:

  • Part 1: Public webinar is open for anyone to attend and has high-level invited speakers: Dr. Jonas Sundqvist, Dr. Tuomo Suntola and Dr. Angel Yanguas-Gil. Additionally, there will be tutorials by Prof. Riikka Puurunen and Prof. Matti Putkonen. (See the webpage & program for details.)
  • Part 2: Local networking is aimed for local (Finland-based) participants. The core of  Part 2 will be an online poster session where submissions from doctoral students, postdocs and other researchers are welcome. Additionally, there will be brief introductions to research groups, companies and projects, and a presentation by Prof. Timo Sajavaara on the characterization of ALD films. For the poster session we hope to create an online experience that resembles a regular conference’s poster session -- let’s see how it works out.

The registration link and all related info, including a preliminary program, are found in the event website: https://www.aalto.fi/en/events/2020-november-networking-ald-at-aalto-university. Registration was opened on 21.10.2020 and will close for participation with presentation on 11.11.2020 and for participation without presentation 22.11.2020.

Friday, 8 March 2019

Millennium Technology Prize to Tuomo Suntola - photos Millennium Talks May 23, 2018

In the an earlier post, photos were shared from the Millennium Technology Prize Gala on May 22, 2018, where Tuomo Suntola received the prize for atomic layer deposition technology.  This post continues from where the previous post (Feb 10) left, and shares photos from the open lecture that Suntola gave on May 23, 2018, at Aalto University.

What is atomic layer deposition (ALD)? The 2018 Millennium Technology Prize winner Tuomo Suntola explains the contents of the lecture to come. (Photo: Riikka Puurunen, 23.5.2018)

Sunday, 10 February 2019

Millennium Technology Prize 2018 to Tuomo Suntola - more photos from May 22

On May 22, 2018, Tuomo Suntola was awarded the prestigious Millennium Technology Prize (MTP) for his Atomic Layer Deposition (ALD) invention, awarded every two years for a life-changing innovation. Before Suntola, the MTP in 2016 was awarded to Frances Arnold. Without ALD - an invisible technology as such - Moore's law could not have continued, and we would not have the computing power (computers, smartphones) of today. The BALD Engineering and Atomic Limits blogs are good sources for recent views on the impact and development of ALD. For more on the Millennium Technology Prize, please view the Technology Academy Finland (TAF) website https://taf.fi/; next call for nominations will open in April 2019.


Dr. Tuomo Suntola (left) received the Millennium Technology Prize as the inventor of Atomic Layer Deposition technology. In the middle of the photo, Sauli Niinistö, president of Finland (middle), who handed the prize. At the right, Marja Makarow (professor, chair of Technology Academy Finland). The prize ceremony was organized on May 22, 2018 in Helsinki (Kaapelitehdas).  Photo by Riikka Puurunen, shared in Wikimedia Commons (CC BY-SA 4.0)

As the drafter of the nomination letter, I was honoured to be invited to the gala event & prize ceremony on May 22, 2018. For me, the prize and the event was literally a dream come true. The event was historical throughout. I wished that more colleagues from the ALD community could have shared the event and the joy and pride.

To record this historical event and to share its details with others, as a hobbyist photographer I took many photos and several short videos at the event. Some I have shared in the ALD History Blog post right after the event, in a video collection on Youtube, and in photos released to Creative Commons.

Now I have gone through my collections again and here I am sharing more photos. I link to the already published Youtube and Wikimedia Commons contents, where appropriate. The photos uploaded in Wikimedia Commons have a Creative Commons (CC) licence that allows everyone to freely use and distribute the photos - the only requirement is that you credit the source and if you make modifications, you share the new versions similarly openly (CC BY-SA 4.0). If you would like to reuse some of the photos shared in the blog but which are not in Wikimedia Commons, please contact me directly - you can find my contact info through the Aalto University website.

Espoo, February 10, 2018
Riikka Puurunen


Friday, 4 January 2019

New article on ALD for catalyst preparation in press, preprint available

First article related to catalyst preparation by atomic layer deposition (ALD) originating from my work as a professor at Aalto University has just been accepted for publication in Topics in Catalysis, special issue on the 18th Nordic Symposium on Catalysis. I have used ChemRXiv for sharing the preprint, so everyone can access the unformatted article already. Link: https://doi.org/10.26434/chemrxiv.7204847.v2.

Why to share information of an accepted article / preprint in ALD History Blog? It is because the Introduction of the article is historically valuable. Namely, it contains original references to both "molecular layering" related and "atomic layer epitaxy" related early ALD works on catalysis. As - to the knowledge of the undersigned - none of the existing reviews written on ALD for catalyst preparation adequately describes and cite the early works, the two passages in the Introduction including the cite references become valuable as a "microreview" on the area. Worth spreading word about.

Riikka Puurunen, Espoo, Finland, January 4, 2019

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Virtual Project on the History of ALD (VPHA) - in atmosphere of Openness, Respect, and Trust

Thursday, 25 May 2017

HERALD COST MP1402 event in Riika (Riga), Latvia

On Monday May 22nd, I visited Riika (Riga), Latvia, giving an invited talk at an event called "ALD nanotechnology: advances, prospects and applications" organized within the framework of the HERALD COST action MP1402 (http://www.european-ald.net/). The programme of the event, as provided by the organizers in advance, is copied at the end of this post.  

My presentation was entitled "On the history and future of ALD: VPHA, conformality analysis, mechanisms". The presentation explained the Virtual Project on the History of ALD (more volunteers are still welcome); introduced the PillarHall ALD conformality test structures developed at VTT (with a modelling example, too!) where we welcome more proof-of-concept partners; and pointed out the existing different views and a need to understand better the "model ALD process" trimethylaluminium-water. The presentation was dedicated to the memory of Mr. Sven Lindfors (1945-2017). At the end, I called for support letters to nominate Suntola and ALD for the Millennium Technology Prize 2018 (more to come on this in another post later). 

The presentation slides can be viewed in SlideShare. Additionally, Aalto University uses a tool called Panopto, with I tried, and with which I very easily could record my talk for later reference. A tool to be used in the future, too! The Panopto record can be viewed here.     

Some photos related to the event/this post below.

Tuesday, 14 March 2017

Krause writes about Aalto University's new catalysis professor

Professor emerita Outi Krause has written a very nice description related my new affiliation as professor of Catalysis Science and Technology at Aalto University. The text was originally meant for and published in "Katse", the newsletter of the Finnish Catalysis Society. With the permission of prof. em. Krause and the chairman of Finnish Catalysis Society, it is republished in this post in full (in Finnish).

--- originally published in Katse 1/2017 ---


Riikka Puurunen Aalto-yliopiston professoriksi


TkT Riikka Puurunen aloitti helmikuun alussa Aalto-yliopiston kemian tekniikan korkeakoulussa määräaikaisena teknillisen kemian professorina (associate professor) erityisalueenaan katalyysi.

Riikka Puurunen on TKK:n kasvatti. Hän aloitti opintonsa Kemian osastolla vuonna 1994, valmistui DI:ksi neljä ja puoli vuotta myöhemmin ja väitteli tekniikan tohtoriksi vuonna 2002. Jatko-opintoihin sisältyi myös vuoden tutkimusjakso K.U. Leuvenissä Belgiassa. Väitöksen jälkeen hän palasi Belgiaan postdoc-tutkijaksi IMEC-tutkimuskeskukseen. Riikka tuli takaisin Suomeen ja Otaniemeen v. 2004 VTT:lle tutkijaksi, josta hän siirtyi Aalto-yliopistoon. Hän jatkaa myös VTT:n osa-aikaisena vanhempana tutkijana tämä vuoden heinäkuun loppuun asti.

Saturday, 11 February 2017

CU Boulder Today, ALD NanoSolutions, VPHA

CU Boulder Today published on Feb 7, 2017 a nice article describing the history of the company ALD NanoSolutions, a spin-off from the University of Colorado Boulder. ALD NanoSolutions is specialized in atomic layer deposition (ALD) for the coating of particles. Link to article: http://www.colorado.edu/today/2017/02/07/spinoff-company-all-cu-boulder-family.

Some quotes from the CU Boulder Today article:
  • In 1997, Professor Alan Weimer of chemical and biological engineering heard a campus talk by Professor Steven George of chemistry about a novel process of coating surfaces with the thinnest of materials possible, known as atomic layer deposition (ALD).
  • Within a few years Weimer and George had filed a number of patents on the technology, gaining exclusive rights to a wide range of intellectual property.
  • “This company has executed with focus and pragmatism since we formed it, and now we are moving into high gear commercially,” says Weimer. “And we have what I call a lot of high-end ethics within the company, which is very important to all of us. That is one reason we are all still together after all these years.”
My first recollection of ALD NanoSolutions is from early 2000s, from the time I was a doctoral student at Helsinki University of Technology - nowadays Aalto University - in the Industrial Chemistry group of Prof. Outi Krause during 1999 to 2002. My research concerned particle ALD for catalyst applications. I started in 1998 as a diploma worker at Microchemistry Ltd. (nowadays part of ASM) in a research line which had been started many years earlier in Finland by Tuomo Suntola at Microchemistry Ltd. and the Finnish oil company Neste Oy (for more info, see the "Suntola story" in CVD 2014, details below). At HUT, we were of course curious of this new company: who is behind it, what is the technology, how will it commercialize ALD? 

Photo of Riikka after visiting ALD NanoSolutions March 18, 2014. (I cannot recall who took the photograph upon my request.  I will be to happy to add the name of the photographer here if the person who remembers to have taken the photo, will contact me.) 

Fast forward more than a decade. In 2014, I had a chance to travel to Boulder and visit Prof. Steven George and his group. At this moment, I worked as a Senior Scientist at VTT Technical Research Centre of Finland.

Sunday, 5 February 2017

New affiliation, a personal note

Through this personal note in ALD History Blog, I would like to inform the VPHA participants as well as other people of a career change which I am currently going through.

February 1st, I started as associate professor (tenure track), Catalysis Science and Technology at Aalto University. My just-created description in the Aalto people pages describes the current status and the near-future plans (as of Feb 5, 2017):  
Associate professor (tenure track), Catalysis Science and Technology. Strong background and continued interest in Atomic Layer Deposition (ALD); aiming to build research e.g. with microreactors and in situ/operando measurements. "Work-hobby:" history of ALD; interested in open science approaches. Feb-Jul 2017 working 60% at Aalto University and 40% at VTT Technical Reseach Centre of Finland; from Aug 2017 on, full time at Aalto University. Open for new (and old!) collaborations. 
For the next half year, I will work part time (60%, typically Wed-Fri) at Aalto University and part time (40%, typically Mon-Tue) at VTT Technical Research Centre of Finland. The remaining work at VTT concentrates on the lateral high-aspect-ratio test structures (LHAR/PillarHall) in a "TUTL" project financed by Tekes.

As an Aalto University professor, I will continue to coordinate the Virtual Project on the History of ALD (VPHA) as before.

Espoo, February 5, 2017
Riikka Puurunen

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Virtual Project on the History of ALD (VPHA) - in atmosphere of Openness, Respect, and Trust

Thursday, 13 October 2016

Term "growth per cycle" (GPC) gaining wider use

"Growth per cycle (GPC)" (unit e.g., nm) and "growth rate" (unit e.g., nm/cyc) have been described as alternative names to denote the time-independent amount of material deposited in a completed atomic layer deposition (ALD) cycle. The recent Baltic ALD 2016 conference confirmed the trend which I have noticed already earlier: the ALD community more and more shifts to use GPC.

I have been advocating the use of GPC since the early 2000s. A bit of history may be in place to explain why I chose to use GPC in the first place---how did it all get started? In the following, I will tell how one specific person has played a major role in the background.


Friday, 3 June 2016

Snapshot of ALD research in Finland - presentations at ALD 2016

The next major international event in the field of atomic layer deposition (ALD) will be the ALD 2016 conference in Ireland in July 2016. To this post, I have collected information on oral presentations from Finland from the conference programme page recently released.

In total, there will be 16 oral presentations from six affiliations in Finland: Aalto University (3), ASM (1), Beneq (1), University of Helsinki (5), University of Jyväskylä (1), and VTT Technical Research Centre of Finland (5). Additionally, there will of course be many poster presentations, including the VPHA poster. Oral presentation titles and times are copied below. 

I think that the titles nicely illustrate the multitude of ALD research being made on ALD in Finland, four decades after the first experiments were made by Suntola and co-workers to make ALD (then ALE, Atomic Layer Epitaxy) based thin-film electroluminescent displays (link). 

Those who have interest in ALD in Finland are all welcome to join the Finland ALD group in LinkedIn, where Finland ALD -related news are shared. There are currently 237 members, most of them from Finland and some from abroad.