Showing posts with label Neste Oy. Show all posts
Showing posts with label Neste Oy. Show all posts

Sunday, 25 November 2018

Neste: "Curiosity and forward looking" describe innovative researcher Tuomo Suntola

Dr. Tuomo Suntola, the Finnish inventor of Atomic Layer Deposition and winner of the 2018 Millennium Technology Prize, worked at the Neste company for over a decade. Recently, Neste published a feature article on Suntola.  With permission, the article is republished in ALD History Blog. 

Original article: https://www.neste.com/people/curiosity-and-forward-looking-describe-innovative-researcher-tuomo-suntola. Related Twitter post: https://twitter.com/NesteGlobal/status/1042465901948350464
Related, 22.5.2018 (in Finnish): https://www.neste.com/fi/neste-onnittelee-vuoden-2018-millennium-teknologiapalkinnon-saajaa-tuomo-suntolaa

Finnish physicist, Dr. Tuomo Suntola, who made an impressive over ten year career at Neste and has won the highly appreciated Millennium Technology Prize this spring, is described as an innovative researcher with a genuine curiosity and passion for his work.

Dr. Suntola worked from 1987 to 1998 as a Managing Director of Microchemistry Ltd, subsidiary of Neste and later Fortum. Lars Peter Lindfors, Neste’s Senior Vice President of Technology had the pleasure of working as a researcher at Neste in the beginning of 1990’s in a cooperation with Suntola and other talented researchers of Microchemistry. The subject of cooperation, as part of the Lindfors dissertation, was the production of catalysts with ALD technology, Suntola’s award winning innovation.

Saturday, 11 February 2017

CU Boulder Today, ALD NanoSolutions, VPHA

CU Boulder Today published on Feb 7, 2017 a nice article describing the history of the company ALD NanoSolutions, a spin-off from the University of Colorado Boulder. ALD NanoSolutions is specialized in atomic layer deposition (ALD) for the coating of particles. Link to article: http://www.colorado.edu/today/2017/02/07/spinoff-company-all-cu-boulder-family.

Some quotes from the CU Boulder Today article:
  • In 1997, Professor Alan Weimer of chemical and biological engineering heard a campus talk by Professor Steven George of chemistry about a novel process of coating surfaces with the thinnest of materials possible, known as atomic layer deposition (ALD).
  • Within a few years Weimer and George had filed a number of patents on the technology, gaining exclusive rights to a wide range of intellectual property.
  • “This company has executed with focus and pragmatism since we formed it, and now we are moving into high gear commercially,” says Weimer. “And we have what I call a lot of high-end ethics within the company, which is very important to all of us. That is one reason we are all still together after all these years.”
My first recollection of ALD NanoSolutions is from early 2000s, from the time I was a doctoral student at Helsinki University of Technology - nowadays Aalto University - in the Industrial Chemistry group of Prof. Outi Krause during 1999 to 2002. My research concerned particle ALD for catalyst applications. I started in 1998 as a diploma worker at Microchemistry Ltd. (nowadays part of ASM) in a research line which had been started many years earlier in Finland by Tuomo Suntola at Microchemistry Ltd. and the Finnish oil company Neste Oy (for more info, see the "Suntola story" in CVD 2014, details below). At HUT, we were of course curious of this new company: who is behind it, what is the technology, how will it commercialize ALD? 

Photo of Riikka after visiting ALD NanoSolutions March 18, 2014. (I cannot recall who took the photograph upon my request.  I will be to happy to add the name of the photographer here if the person who remembers to have taken the photo, will contact me.) 

Fast forward more than a decade. In 2014, I had a chance to travel to Boulder and visit Prof. Steven George and his group. At this moment, I worked as a Senior Scientist at VTT Technical Research Centre of Finland.

Friday, 5 February 2016

Suntola's English Wikipedia page is updated

Tuomo Suntola must be one of the greatest Finnish scientists, inventors, industrialists of all times. I am happy to share that Tuomo Suntola's Wikipedia page in English has been updated related to VPHA Publication Plan Item #11 with the most important turns of Suntola's career. This his how in Wikipedia the page https://en.wikipedia.org/wiki/Tuomo_Suntola, "Training and Career", reads at the moment:

"In 1971, Tuomo Suntola earned his PhD in semiconductor physics from the Helsinki University of Technology. After completing his PhD, Suntola made his first industrial development while working at VTT Technical Research Centre of Finland, a thin film humidity sensor “Humicap” for Vaisala Oy, a Finnish company specialized in meteorological instruments.