Wednesday, 4 May 2016

VPHA communication: first ALD reviews (ALE, ML)

The email below was sent on May 4, 2016, to 54 VPHA co-authors and 35 prospective co-authors. 
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Dear VPHA co-authors and prospective co-authors,

The VPHA reading is progressing slowly but steadily. According to the VPHA-reading-overview-file, the percent of reading completed is now 46.8%. I hope that by May 14th, this number will be >> 50%.

While studying at the general progress, I've noticed that the two reviews written by the inventors/developers of ALD (ALE, ML), have not yet received very many comments in the ALD-history-evolving-file. These are the reviews by Aleskovskii (4 comments) and Suntola (1 comment):


Aleskovskii, V. B.
Chemistry and technology of solids.
J. Appl. Chem. USSR., 47, 2207-2217, 1974 [in English] (Translated from: Zh. Prikl. Khim. 47, 2145-2157, 1974)
В. Б. алесковский, О химии и технологии твердых веществ. Журнал прикладной химии, 1974, Т. 47, вып. 10, С. 2145-2157.
{Aleskovskii1974} en ru

Suntola, T. & Hyvärinen, J.
Atomic layer epitaxy
Annu. Rev. Mater. Sci., 1985, 15, 177-195
{Suntola1985} en

These two reviews have both been written roughly ten years after active investigations were initiated on ALD (on ML and ALE). I recommend reading them to all participants of VPHA, as reading these can one understand the other, more detailed publications. When you read them, please share your view on the contents in the ALD-history-evolving-file.

Best regards,
Thanking everyone for their efforts,
Riikka, VPHA coordinator
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Riikka Puurunen (Dr.), Senior Scientist, Microsystems and Nanoelectronics; Project Manager (IPMA C)
VTT Technical Research Centre of Finland, Tietotie 3, Espoo (P.O. Box 1000), FI-02044 Espoo (VTT), Finland

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Virtual Project on the History of ALD (VPHA) - in atmosphere of Openness, Respect, and Trust

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