Saturday, 16 February 2019

VPHA brief communication / ALD 2019 poster abstract SUBMITTED

The message below was sent to 78 VPHA contributors.

From: Puurunen Riikka < >
Sent: 16. helmikuuta 2019 6:26
To: info at vph-ald.com
Subject: VPHA brief communication - ALD 2019 poster abstract SUBMITTED 15.2.2019

Dear VPHA contributors,

For your information, an abstract has been submitted yesterday to the ALD 2019 conference https://ald2019.avs.org/ (Twitter: #ALDALE2019) in Bellevue, Washington, USA entitled “Overview of doctoral theses on Atomic Layer Deposition worldwide - outcome of the Virtual Project on the History of ALD”.


The abstract text was submitted online; the text has been copied below for your reference. Further, attached you find a file that contains the full author list, sent as supplementary information this time (only twenty authors could be entered in the online system  - thanks to Aris for helping with the submission system this time).

The goal was to prepare and submit figures as supplementary information. Because only one page could be accommodated in the supplementary info, and the full author list needed to be provided this way, the figures had to be left out. Instead, they have been shared in Twitter for everyone’s attention, see below - thanks to Felix for creating these figures.

According to communication from the conference, decisions on acceptance are expected by April 8, 2019.

With best regards,
Thank you again for collaboration,
Riikka Puurunen, voluntary VPHA coordinator
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Riikka Puurunen, Associate professor, Catalysis Science and Technology
Aalto University, School of Chemical Engineering, Department of Chemical and Metallurgical Engineering
Visiting address: Kemistintie 1, 02150 Espoo, Finland, room: E412
Mail address: P.O. Box 16100, FI-00076 AALTO, Finland
Tel: <>, email: <>
, LinkedIn, @rlpuu

---poster  abstract info ALD 2019 begins ---
<content removed from the post>

--- poster abstract info ALD 2019 ends ---

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Virtual Project on the History of ALD (VPHA) - in atmosphere of Openness, Respect, and Trust

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