Tuomo Suntola's main review on Atomic Layer Deposition (Epitaxy) now Open Access

Open Access for Dr. Tuomo Suntola's main review on atomic layer deposition has been kindly given by the Elsevier publisher (per request, for a year’s time?). As the review is from 1989, it is still entitled ”atomic layer epitaxy”. In the (evolving) list of publications on the history of ALD on the website of the Virtual Project on the History of ALD (VPHA), this review is currently the oldest one listed.  

• Tuomo Suntola, Atomic Layer Epitaxy, Materials Science Reports, Volume 4, Issue 5, 1989, Pages 261-312, https://doi.org/10.1016/S0920-2307(89)80006-4.

For the 1989 review, among other things, Suntola mapped the laboratories working with ALD known to him at that time. The list is in Table 1 and ordered according to the first publication. The list is very interesting to read through. I notice laboratories (in alphabetical order) from Austria, Canada, China, Finland, France, Germany, Japan, Netherlands, UK, USA. From Finland, the list gives (in the order of first publication) Lohja Oy; Tampere University of Technology; Helsinki University of Technology, Laboratory of Physics; Helsinki University of Technology, Department of Chemistry; Joensuu University. 

I hope many people interested the field of ALD will have a look at the article - and perhaps even cite it in future publications. 

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Virtual Project on the History of ALD (VPHA) - in atmosphere of Openness, Respect, and Trust