Saturday, 24 November 2018

ECS meeting invited ALD history talk: slides and proceedings

In October 2018, I had the honor to give an invited talk at the Electrochemical Society (ECS) fall meeting, organized in Cancun, Mexico (AiMES2018). ECS has had an ALD session since early 2000s. For me, this was the first time to attend the event: I got a very nice impression of the ALD session specifically and on this massive meeting in general.

The talk was called "Learnings from an Open Science Effort: Virtual Project on the History of ALD". Abstract is as follows:
"This work summarizes learnings from an Open Science effort “Virtual project on the History of ALD” (VPHA), started in 2013 to clarify the early history of atomic layer deposition (ALD). ALD is a multi-tool of nanotechnology and has been e.g. enabler of the continuation of Moore’s law of transistor scaling. ALD has been developed historically through two independent routes: atomic layer epitaxy (ALE) and molecular layering (ML). Especially the details on ML have remained little known to a broader audience. In this contribution, learnings in VPHA are seen from the viewpoint of its voluntary coordinator (the author self) related to historical details of ALD as well as from an organizational viewpoint and some other viewpoints. Selected details related to ALD’s history not fully accurately described in three earlier review articles are pointed out. The work made in VPHA has resulted in journal articles, presentations and an exhibition, and VPHA has in part provided the foundation for granting the 2018 Millennium Technology Prize to Dr. Tuomo Suntola. At the time of writing this contribution, in July 2018, VPHA is still on-going, and more volunteers are welcome to join the effort."

The slides are available through ECSarXiv: (DOI: 10.1149/
The ECS Transaction contribution is available as an open-access preprint through (DOI: 10.1149/

  • Citation details: R. L. Puurunen, Learnings from an Open Science Effort: Virtual Project on the History of ALD, ECS Transactions 2018 volume 86, issue 6, 3-17. doi: 10.1149/08606.0003ecst 

Noteworthily, there was also an interesting tutorial at the AiMES2018 conference on ALD reactant development by Prof. Charles Winter. His slides can be accessed through ECSarXiv: Related to the discussion on the growth rate vs GPC terminology, I link back to a post I wrote two years ago on the topic, on why I did not (/was not allowed to) use "growth rate":

Virtual Project on the History of ALD (VPHA) - in atmosphere of Openness, Respect, and Trust

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